Laser Direct Writing Lithography System- DWL 66+

2021/1/25 14:42:43


Overview:Laser direct writing lithography system is a micro-nano fabrication equipment controlled by a computer. It scans a high-precision laser beam to directly expose and write any designed pattern on the photoresist, thus directly transfers the designed pattern to a mask.

Applications:1. MEMS;2. Micro Optics;3. Sensors, ASICs;4. Bio-MEMS


Max. exposure area: 200 × 200 mm2;

Min. structure size: 300 nm;

Edge roughness: 50 nm;

Address grid:10nm