Overview：Laser direct writing lithography system is a micro-nano fabrication equipment controlled by a computer. It scans a high-precision laser beam to directly expose and write any designed pattern on the photoresist, thus directly transfers the designed pattern to a mask.

Applications：1. MEMS；2. Micro Optics；3. Sensors, ASICs；4. Bio-MEMS

Features：

Max. exposure area： 200 × 200 mm2；

Min. structure size： 300 nm；

Edge roughness： 50 nm；

Address grid：10nm