Rapid Thermal Processing

2021/1/25 12:14:38


Overview:The instrument provides a rapid thermal processing, during which the sample can be heated to over 1000℃ within several seconds via infrared halogen lamp. The annealing process is so rapid that there is almost no diffusion of atoms in the sample.

Applications: Rapid Thermal Processing, Annealing, Oxidation, Nitridation; Contact Alloying; Crystallization.


Heat Source:Halogen Lamp

Maximum annealing temperature:1200℃,

Maximum heating rate:180℃/sec

Maximum wafer size :4 inch

Atmospheric and vacuum process capability