Overview：The instrument provides a rapid thermal processing, during which the sample can be heated to over 1000℃ within several seconds via infrared halogen lamp. The annealing process is so rapid that there is almost no diffusion of atoms in the sample.

Applications： Rapid Thermal Processing, Annealing, Oxidation, Nitridation; Contact Alloying; Crystallization.

Features：

Heat Source：Halogen Lamp

Maximum annealing temperature：1200℃，

Maximum heating rate：180℃/sec

Maximum wafer size ：4 inch

Atmospheric and vacuum process capability