Overview：Rapid annealing processing rapidly heats and cools samples to limit heat exposure. 

Applications：Rapid thermal alloying, annealing, implant activation, oxidation and reflow.

Features：

• Application range: Room temperature to 400 ℃, room temperature to 350 ℃, duration is less than 10 minutes. 

• Cooling method: Rapid water cooling, 350 ℃ Cooling to 100 ℃, duration is less than 10 minutes. 

• Temperature control accuracy: ± 0.1 ℃