Overview：NanoFrazor lithography is the fastest and most versatile of all Scanning Probe Lithography techniques. Core of the NanoFrazor technology is an ultra-sharp heatable probe tip which is used for writing and simultaneous inspection of complex nanostructures. The heated tip creates arbitrary, high-resolution nanostructures by local sublimation of resists. Standard pattern transfer methods like lift-off or etching can be applied.  It is installed in the glovebox to enable nanolithography of sensitive materials in inert conditions.

Applications：rapid prototyping of 3D quantum devices.

Features：

• Resolution below 20 nm

• In-situ high-speed AFM topography imaging

• Samples size up to 50 x 50 mm2

• Closed-Loop Lithography

• Precise markerless overlay and stitching using in-situ AFM

• No damage of sensitive materials (no electron or ion beams)

• Alternative patterning mode: direct nanoscale thermal conversion

• Small footprint

• Easy to use (no wet development, no vacuum, etc.)