Engineering Salon 2

2021/05/21

The Engineering Salon aims at communication, break- through, succession, innovation and development, which will provide a platform for exchange and demonstration, and encourage the engineer craftsman spirit of overcoming difficulties and striving for perfection in the engineering team.  All scientists, postdocs and engineers are welcome to join us!


Date: May 21, 2021 (Friday) 13:30-15:40

Venue: Room 526

Host: Tiefu Li, Director of Division of Quantum Engineering Research

 

1) Precise construction of van der Waals heterojunction devices

Miaoling Huang,  Engineer

Abstract:Van der Waals heterojunctions, which consist of two dimensional materials stacked on each other, can produce many amazing quantum physics phenomena. This report will present the research progress and application prospect of van der Waals heterojunction devices, and report the status of electric precision stacking platform in the inert atmosphere of the Synergetic Quantum Transport Measurements Lab.


2) The principle of plasma discharge and reactive ion etching process

Wenyan Wang, Senior Engineer

Abstract:Based on the principle of plasma discharge, this report introduces several methods of plasma discharge and the corresponding plasma etching devices, and focuses on the basic structure of reactive ion etching equipment, the process of reaction etching and the factors affecting the etching process. The last part of the report introduces the etching process results of superconducting niobium film and tantalum film using the reactive ion etching system(RIE-200NL)of the micro-nano processing platform, and summarizes the ashing rate for different types of photoresists using the plasma stripper system(PC-1100).

 

3) Introduction to low temperature dry refrigeration technology

Jian Cui, Engineer

Abstract:Extremely low temperature and strong magnetic field system is an extremely important experimental environment in modern physics research, and it is an essential experimental condition for quantum computation and quantum physical property measurement. Due to the shortage of helium, dry refrigerators are becoming the first choice of experimental equipment. taking dry refrigerator as an example,this report will briefly introduce the development, principle and application of cryogenic refrigerator.

 

4) Brief introduction of Electron Beam Lithography

Mo Chen, Senior Engineer

Abstract:Electron beam lithography is an important method for obtaining nanoscale patterns, which is widely used in research fields such as materials, physics, optics, and microelectronics, as well as processing fields such as devices and chips. This report briefly introduces the working principle of electron beam lithography equipment and common problems in the electron beam lithography process.

 

5) Sample Fabrication Technology Based on Focused Ion Beam

Yufeng Wu, Engineer

Abstract:Focused Ion Beam (FIB) uses a high-intensity focused ion beam to sputter or mill samples. In addition to basic analysis of materials, FIB can also directly act on the sample surface to perform nano-scale milling, or selectively deposit material on the sample surface via ion beam induced deposition. Compared with other traditional mechanisms, it has many unique advantages. This report will combine with the specific fabrication process based on FIB to give a detailed introduction about these functions.


6) The Application of Electron Beam Lithography in Micro/Nano Device Fabrication

Zongwei Gao, Senior Engineer

Abstract:The state-of-the-art electron beam lithography (EBL) technology has been most widely implemented for the fabrication of micro and nano devices, especially in the prototype development of new quantum devices at laboratory stage. The high flexibility in pattern replication of EBL has greatly shortened the development cycle of new device structures. In this report, the basic principle of EBL, the facility of EBL, and the commonly used resist for EBL, will be introduced respectively. The method to achieve a higher quality in patterning a variety of sub-micro structures will be also analyzed and discussed.